Chip-making precursor that deposits cleaner films
| Why | Category | Data centers & chips |
|---|---|---|
| Level | Hard | |
| Use | Gas molecule that lays down one atomic layer at a time, with fewer impurities | |
| What | Atoms | Molecule 10–40 + surface 100–300. Al Hf Ti Ru C H N O |
| How | Contact us for the design specs and build plan → | |
| Demo | Precursor lands, reacts, leaves a clean layer, pulse by pulse | |
| Competition | In-house R&D at suppliers | |
| Business | Buyers | Merck (EMD), Air Liquide, Entegris; users TSMC, Intel, Samsung |
| Revenue | High Co-development ~$0.5–2M, royalty on chemical sales. ~$1–5M/yr | |